Microelectronics Research Center

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Equipment log for the ALD - Al2O3


2009-7-7
Testing of the ALD process for Al2O3 is continuing
2009-6-5
The video card in the computer has failed. It will be replaced next week.
2009-6-24
The staff is performing a full DOE to try to optimize the film. This process is ongoing so please bear with us as we try to optimize this process. Thank you.
2009-6-18
There are personnel that are continuing to optimize the processes on these machines. Progress reports will be forthcoming.
2009-6-15
Optimization of this process is ongoing.
2009-6-12
The MiRC staff will be conducting extensive testing on the machine this summer focusing on creating better recipes for Al2O3 and SiO2 and would like some feedback on the tool before we proceed. Has anyone experienced any persistent problems or fall off of performance from the tool? How many cycles do you average per run and what deposition rate are you currently seeing from the tool. What quality of the film is most important to you and what would you like to see changed on the tool. Any input will be very helpful as we move forward with the progress of the tool,
2009-6-11
Optimization of recipes is continuing. Some of the students that are here for research experience for the summer are assisting in this process.
2009-5-8
The SiO2 recipe is functioning properly but needs to be optimized. Any user that wants to try this process or help in the optimization should see John Pham.
2009-5-7
The SiO2 recipe is functioning properly but needs to be optimized. Any user that wants to try this process or help in the optimization should see John Pham.
2009-5-29
Further testing on the Al2O3 recipe is continuing as the staff needs to investigate some recent inconsistencies in the film.
2009-5-27
A test run on the SiO2 was performed today. The results of that test will be provided to the users tomorrow.
2009-5-26
The SiO2 recipe is currently being tested again.
2009-5-22
The SiO2 recipe is still being optimized. The delivery of the precursor in the system is also being optimized.
2009-5-20
The SiO2 process is still being optimized. There have been intermittent problems with the precursor for this recipe. The problem is being investigated as are options for optimizing gas flow.
2009-5-19
The optimization of the SiO2 process is continuing. Some promising results were obtained today. More testing will occur then.
2009-5-15
Optimization of the SiO2 process is continuing. Certain process adjustments (e.g. breaking process time into blocks) will be tested next week. Additionally, all points in the gas path / line have been cleaned to ensure proper functioning. The line heating will be evaluated next week.
2009-4-30
The Al2O3 process should be working normally. The SiO2 process is currently still being tested as there are issues with the valve and the material being deposited in the manifold. An email will be sent out when that process has been fully developed & characterized and is ready for use.
2009-4-23
The flexible hose has been replaced and a trap has been added to the pump. The machine has been marked up.
2009-4-21
Chamber would not pump down. Various fixes were tried (including restarting the pump after letting it cool) but nothing was successful. The problem will be further investigated in the morning.
2009-4-1
The pressure gauge has been replaced with a new calibrated gauge. After testing the aluminum oxide recipe, the tool was found to be working and has been marked back up.
2009-3-31
Other pressure sensor from vendor became uncalibrated after sitting on shelf for 1 month after arrival. Will be calibrated tomorrow. Other pressure gauge failed catastrophically. Has been sent out for repair under warranty. An email will be sent out when more information is available. We intend to purchase a spare pressure sensor.