Microelectronics Research Center

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Equipment Trainers Instructions & Data
Bioforce Nano eNabler
nanoenabler-users@grover.mirc.gatech.edu
The Nano eNabler is a multifunctional surface patterning platform for dispensing attoliter to femtoliter volumes of biomolecules, nanoparticles and other liquids onto a wide variety of surfaces. It is faster and more flexible than conventional technologies, and has no clogging or misalignment problems, as well as multiplexing ability.
-Spot and line sizes: 1 to 30 microns
-100 msec printing cycle
-20 nm stage resolution
-50 mm XY travel
-Multiplexing ability.
-Accommodates samples up to 4 inches
Click here for more information on the Nano eNabler
David Gottfried
Paul Joseph

Email Trainers
 
FEI Nova Nanolab 200 FIB/SEM
nova-users@grover.mirc.gatech.edu
The Nova Nanolab is designed to be a complete nanotechnology laboratory in one tool. It combines ultra-high resolution field emission scanning electron microscopy (SEM) and precise focused ion beam (FIB) etch and deposition. It extends your applications range for nanoscale prototyping, machining, 2D and 3D-characterization and analysis.
-Resolution @ 30 kV STEM- 1.0nm
-Resolution @ 5 kV (TLD-SE)- 2.0nm
-Minimum deposition line width: 20 nm
-Minimum etched Si line width: <15nm

Click here for more information on the Nova Nanolab 200
Joel Pikarsky
Christine Kranz
Kevin Martin

Email Trainers
 
FEI Quanta 200 3D FIB/SEM
quanta-users@grover.mirc.gatech.edu
The Quanta 3D is designed to be a 3D-SEM. It combines traditional thermal emission Scanning Electron Microscopy (SEM) with Focused Ion Beam (FIB) to extend application ranges for 3D characterization and nanoanalysis. It allows charge-free imaging of a non-conductive specimen through its variable pressure vacuum system (ESEM) and gas chemistries for high-volume milling. Allows for:
-Crack tip 3D reconstruction
-Revealing sub-surface cause of surface defects on finished metal surfaces
-Characterization of strained materials along orthogonal sections
-Resolution of 3.5nm @ 30kV @ high vacuum
-5 axis motorized stage
-379 mm wide chamber
Click here for more information on the Quanta 200 3D
Joel Pikarsky
Christine Kranz

Email Trainers
 
Kulick Dicing Saw 7100AD
A dicing saw employs a high-speed spindle fitted with an extremely thin diamond blade to dice or groove semiconductor wafers and other workpieces. The dicing saw automatic performs loading, alignment, dicing, washing/drying and then reloading of the workpiece back into the cassette.
-Soft blade-width: 50 microns, sample size: > 500 microns X 500 microns
Best for: soft and thin materials with tight tolerance and limited metal deposition on the surface. Blank silicon and Pyrex wafers along with polysilicon or clean process wafers
-Standard blade- width: 250 microns, sample size: > 1000 microns X 1000 microns
Best for: Processed wafers with photo resist or heavy metal deposition.
-Hard blade- width: 400 microns, sample size: > 3000 microns X 3000 Microns
Best for: Hard, thick, and brittle wafers like Lithium Niobate, Quartz, and heavy glass.
Charlie Suh
Ben Hollerbach

Email Trainers
 
M-10A Semi-Automatic Flip Chip Die Bonder
flipchip-users@grover.mirc.gatech.edu
The M-10 A is a versatile machine that is designed to perform high accuracy, flip chip die bonding in both prototype and limited production modes.
-Substrate Size: 0.2-150mm
-Alignment Accuracy: +/- 1 um
-Bonding Accuracy: +/- 2 um
Joel Pikarsky
Charlie Suh

Email Trainers
 
Tencor Alpha-Step Profilometer
alphastep-users@grover.mirc.gatech.edu
The Alpha-Step Profilometers measures the difference in thickness across a sample and may be used to measure deposition thicknesses.
Charlie Suh

Email Trainers
 

Equipment Log

Veeco AFM
afm-users@grover.mirc.gatech.edu
The Dimension 3100 Scanning Probe Microscope (SPM) utilizes automated atomic force microscopy (AFM) and scanning tunneling microscopy (STM) techniques to measure surface characteristics for semiconductor wafers and other samples up to 200 mm in diameter.
Click here for more information on the Veeco AFM
Eric Woods
Rebhadevi Jeevagan
Philseok Kim
Joel Pikarsky

Email Trainers


AFM data

Equipment Log

XPS SSX-100
xps-users@grover.mirc.gatech.edu
XPS, also known as ESCA, is the most widely used surface analysis technique because of its relative simplicity in use and data interpretation. Using this machine the elemental identity, chemical state, and quantity of an element on a substrate can be determined. The information XPS provides about surface layers or thin film structures is of value in many industrial applications including: polymer surface modification, catalysis, corrosion, adhesion, semiconductor and dielectric materials, electronics packaging, magnetic media, and thin film coatings used in a number of industries
Dan Berrigan
Brent Carter

Email Trainers
 
Zeiss SEM Ultra60
fesem-users@grover.mirc.gatech.edu
The Zeiss scanning electron microscope is the instrument of choice for clear and precise imaging on large delicate specimems or uncoated wafers. The ULTRA 60 enables clear topographic imaging with the high efficiency In-lens SE detector.

  • Ultra high resolution imaging at low kV
  • Extra large 6-axes motorised fully eucentric stage with fine stage control
  • Large sample throughput with integrated 8" airlock
  • High efficiency In-lens SE detector for high contrast surface imaging
  • Download SmartTiff - download this program from Zeiss to let you do measurements on your images
  • This tool has been moved from the cleanroom to room 160.
    Click here for more information on the Zeiss SEM
Joel Pikarsky
Charlie Suh

Email Trainers