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MiRC acquires powerful new software for the JEOL JBX-9300FS
Will provide users with more accurate, robust, and uniform nanoscale patterning
Sep 29, 2008:
The Georgia Tech Microelectronics Research Center has recently acquired powerful new software to greatly enhance its JEOL JBX-9300FS 100kV direct write electron beam lithography system needed for demanding nanometer scale applications. Two software packages have been obtained. The first is Sceleton, an electron solid interaction Monte Carlo simulator, provided by Dr. B. E. Maile of Ulm, Germany. The second software package is Layout BEAMER provided by GenISys GmbH, based in Munich, Germany. These two packages combined will provide users with more accurate, robust, and uniform nanoscale patterning with a fast, flexible and easy to use interface.
Sceleton is a Monte Carlo simulator to provide an accurate model of the interaction of electrons with a users substrate. The user defines a stack of materials which describes the substrate to be patterned and the software generates a point spread function that models the forward and backscattering of electrons that will occur in that particular sample. This point spread function can then be passed to Layout BEAMER for automatic dose correction of a users CAD pattern.
Layout BEAMER is a comprehensive software package to perform e-beam data preparation, including proximity effect correction, data fracturing to JEOL J52 v3.0 data format, and process modeling. Layout BEAMER can perform pattern transformations such as scale, rotation, mirror, healing, biasing, Boolean functions and so on. Proximity effect correction includes both short range forward scattering and long range back scattering capability either as a Gaussian approximation or using a point spread function created by Sceleton. Furthermore, the user interface allows easy and intuitive use with a simple drag and drop of functional modules, providing increased productivity and efficiency.
For more information, please contact Devin Brown, Senior Research Engineer at devin.brown@mirc.gatech.edu or (404) 385-4220.