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| Process | 2% SiH4 Flow (sccm) | N2Flow (sccm) | N2O Flow (sccm) | Pressure (sccm) | Power (W) | Temp (°C) | Rate (Å / min) |
|---|---|---|---|---|---|---|---|
| High Freq. Nitride | 2000 | 40 | 900 | 20 @ 13.56 MHz | 300 | 140 | |
| Low Freq. Nitride | 2000 | 10 | 550 | 60 @ 380 kHz | 300 | 460 | |
| Low Stress Nitride | 2000 | 30 | 750 | 20 @ 13.56 MHz / 6 sec 20 @ 380 kHz / 1.5 sec |
300 | 80 | |
| High Freq. Oxide | 400 | 1420 | 800 | 20 @ 13.56 MHz | 300 | 480 | |
| Low Freq. Oxide | 400 | 1420 | 550 | 60 @ 380 kHz | 300 | 720 |