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Processing Request Rates:
Processes:
Charges listed below are for a batch of up to 50 wafers. For quantities greater than 50, charges will be multiplied appropriately.
Wafer Cleaning: $50
Atmospheric processes: $150/hour
Processes take 1.5 hours to complete.
Dry Oxidation: $150 for up to 1000Å
Thicknesses greater than 1000Å should be achieved with wet oxidation.
Wet Oxidation: $150 for up to one hour, $60 for each additional hour
Time increases exponentially as thickness increases.
Low Pressure: $300 for up to 1µ of deposits + an additional $60/.5µ.
CMOS Fab Runs:
Fab Run costs are computed on a case-by-case basis. Please contact janet.cobbsullivan@gtri.gatech.edu for further information.